E2245-02 - Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer
Description: This test method covers a procedure for measuring the compressive residual strain in thin films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an interferometer. Measurements from fixed-fixed beams that are touching the underlying layer are not accepted.
Category: ASTM International Standards Specifications
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